Wednesday, March 3

Tag: euv

Imec demonstrates the effectiveness of carbon nanotube pellicle for EUV

Imec demonstrates the effectiveness of c ...

News
Belgian imec, an advanced semiconductor research institute, announced that it has demonstrated the effectiveness of carbon nanotube (CNT) -based reticle that protects the reticle from foreign particles in EUV lithography.Specifically, by attaching multiple CNT-based pellicle films to the reticle and... ...